Title:
REFLECTIVE MEMBER AND GLASS LAYERED MEMBER PRODUCTION METHOD
Document Type and Number:
WIPO Patent Application WO/2021/049256
Kind Code:
A1
Abstract:
Provided is a reflective member which does not generate dust when used, has high fracture toughness, and allows damage to be prevented in a high temperature environment during production and during use while maintaining high reflectivity. Also provided is a production method for a glass layered member suitable as the reflective member. The reflective member has a layered structure comprising a non-transparent siliceous sintered powder layer having an upper surface and lower surface on which a transparent quartz glass member is formed. The thickness of the non-transparent siliceous sintered powder layer is 0.1 mm or thicker. The film thickness distribution is ±0.05 mm or less. When a load is applied, in a parallel direction to the layered structure, onto the transparent quartz glass member on the upper surface and on the lower surface of the layered structure, the fracture load is 5 N or greater per 1 cm2. At the boundaries between the non-transparent siliceous sintered powder layer and the transparent quartz glass member of the layered structure, the width of a half-transparency section where the non-transparency is between that of the non-transparent siliceous sintered powder layer and the transparent quartz glass member is 0.01 mm or less.
Inventors:
SEGAWA TORU (JP)
YAMAGUCHI KAZUHIRO (JP)
WATANABE TOMONORI (JP)
FUJITA DAIKI (JP)
YAMAGUCHI KAZUHIRO (JP)
WATANABE TOMONORI (JP)
FUJITA DAIKI (JP)
Application Number:
PCT/JP2020/031011
Publication Date:
March 18, 2021
Filing Date:
August 17, 2020
Export Citation:
Assignee:
SHIN ETSU QUARTZ PROD CO LTD (JP)
YAMAGATA SHIN ETSU QUARTZ PRODUCTS CO LTD (JP)
HERAEUS QUARZGLAS (DE)
YAMAGATA SHIN ETSU QUARTZ PRODUCTS CO LTD (JP)
HERAEUS QUARZGLAS (DE)
International Classes:
C03B23/20; C03B20/00
Foreign References:
JP2013035723A | 2013-02-21 | |||
JP2017154945A | 2017-09-07 | |||
JP2017165643A | 2017-09-21 | |||
JP2009084113A | 2009-04-23 | |||
JP2018531863A | 2018-11-01 | |||
JP2004067456A | 2004-03-04 | |||
JP2002160930A | 2002-06-04 | |||
JP5679591B2 | 2015-03-04 | |||
JPS5748605B2 | 1982-10-16 | |||
JP2009302547A | 2009-12-24 |
Attorney, Agent or Firm:
ISHIHARA, Shinsuke et al. (JP)
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