Title:
REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK
Document Type and Number:
WIPO Patent Application WO/2022/065494
Kind Code:
A1
Abstract:
This reflective photomask blank (10) is provided with a substrate (1), a reflective layer (2) and an absorption layer (4), in that order. The absorption layer (4) includes a material in a first material group and a material in a second material group, the content of the material in the first material group decreases from the substrate (1) side towards the outermost surface (4a) side of the absorption layer (4), and the content of the material in the second material group increases from the substrate (1) side towards the outermost surface (4a) side of the absorption layer (4). The first material group is Te, Co, Ni, Pt, Ag, Sn, In, Cu, Zn and Bi, and oxides, nitrides and oxynitrides thereof; the second material group is Ta, Cr, Al, Si, Ru, Mo, Zr, Ti, Zn, In, V, Hf and Nb and oxides, nitrides and oxynitrides thereof.
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Inventors:
MATSUI KAZUAKI (JP)
GODA AYUMI (JP)
GODA AYUMI (JP)
Application Number:
PCT/JP2021/035429
Publication Date:
March 31, 2022
Filing Date:
September 27, 2021
Export Citation:
Assignee:
TOPPAN INC (JP)
International Classes:
G03F1/24; C23C14/08; G03F1/54
Domestic Patent References:
| WO2018135468A1 | 2018-07-26 |
Foreign References:
| US20190146331A1 | 2019-05-16 | |||
| JP2007273678A | 2007-10-18 |
Attorney, Agent or Firm:
HIROSE Hajime et al. (JP)
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