Title:
RESIN MEMBRANE FILTER AND PRODUCTION METHOD FOR RESIN MEMBRANE FILTER
Document Type and Number:
WIPO Patent Application WO/2023/002840
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing: a resin membrane filter that offers excellent separation precision and has superior toughness; and a method for producing the resin membrane filter. This resin membrane filter has a first main surface and a second main surface and has a plurality of through-holes. Regarding the through-holes: when Sva represents the average area of openings at a position A that is separated from the first main surface by a distance equal to 10% of the thickness of the resin membrane film, and Svb represents the average area of openings at a position B that is separated from the first main surface by a distance of 90% of the thickness of the resin membrane film, the relation 0.8≤Sva/Svb≤1.25 is satisfied; and a quantitative proportion Ra of through-holes having an opening area greater than 1.25 times of Sva at position A is 3.0% or less, and a quantitative proportion Rb of through-holes having an opening area greater than 1.25 times of Svb at position B is 3.0% or less.
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Inventors:
YONEZAWA HIROYUKI (JP)
Application Number:
PCT/JP2022/026551
Publication Date:
January 26, 2023
Filing Date:
July 04, 2022
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
B01D39/16; B01D69/00; G03F7/004; G03F7/027; G03F7/039
Foreign References:
| JP2013537469A | 2013-10-03 | |||
| JP2018538151A | 2018-12-27 |
Attorney, Agent or Firm:
ITOH Hideaki et al. (JP)
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