Title:
RESIST COMPOSITION FOR IMPRINTING
Document Type and Number:
WIPO Patent Application WO/2014/097761
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a resist composition for imprinting, which is not susceptible to foaming and is suppressed in decrease in the surface tension of a resist material, while maintaining high mold releasability and having low impact on the environment.
The present invention is a resist composition for imprinting, which contains (A) a curable resin or a curable monomer, (B) a crosslinking catalyst and (C) an additive type mold release agent.
Inventors:
YAMASHITA TSUNEO
HONDA YOSHITAKA
MORITA MASAMICHI
HONDA YOSHITAKA
MORITA MASAMICHI
Application Number:
PCT/JP2013/079995
Publication Date:
June 26, 2014
Filing Date:
November 06, 2013
Export Citation:
Assignee:
DAIKIN IND LTD (JP)
International Classes:
H01L21/027; B29C59/02; C09K3/00; B29K27/12; B29K71/00
Domestic Patent References:
| WO2003097717A1 | 2003-11-27 | |||
| WO2011002072A1 | 2011-01-06 |
Foreign References:
| JP2012216655A | 2012-11-08 | |||
| JP2009265450A | 2009-11-12 | |||
| JP2011012109A | 2011-01-20 | |||
| JP2012109514A | 2012-06-07 | |||
| JPH10149588A | 1998-06-02 | |||
| JP2011232632A | 2011-11-17 |
Other References:
TSUNEO YAMASHITA ET AL.: "Novel Fluorinated Compounds as Release Materials in Nanoimprint Lithography", THE CHEMICAL TIMES, no. 23C, 4, 1 October 2013 (2013-10-01), pages 2 - 6, Retrieved from the Internet
Attorney, Agent or Firm:
YASUTOMI & Associates (JP)
Patent business corporation Yasutomi international patent firm (JP)
Patent business corporation Yasutomi international patent firm (JP)
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