Title:
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR PRODUCING COMPOUNDS, INTERMEDIATE, AND COMPOUNDS
Document Type and Number:
WIPO Patent Application WO/2022/265034
Kind Code:
A1
Abstract:
The resist composition comprises a resin component (A1) and a compound (B0) represented by general formula (b0) (In the formula, X0 is a bromine atom or iodine atom. Rm is a hydroxy group, etc. nb1 is 1 to 5, nb2 is 0 to 4, and 1 ≤ nb1 + nb2 ≤ 5. Yb0 is a divalent linking group or a single bond. Vb0 is a single bond, alkylene group, or fluorinated alkylene group. R0 is a hydrogen atom, C1-C5 fluorinated alkyl group, or fluorine atom. Rb1 to Rb15 are each independently a hydrogen atom or a substituent. However, at least two of Rb1 to Rb5 are a fluorine atom or at least one of Rb1 to Rb5 is a perfluoroalkyl group.).
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Inventors:
MIYAKAWA JUNICHI (JP)
KATO HIROKI (JP)
NGUYEN KHANHTIN (JP)
IKEDA TAKUYA (JP)
TODOROKI SEIJI (JP)
MATSUSHITA TETSUYA (JP)
KATO HIROKI (JP)
NGUYEN KHANHTIN (JP)
IKEDA TAKUYA (JP)
TODOROKI SEIJI (JP)
MATSUSHITA TETSUYA (JP)
Application Number:
PCT/JP2022/023904
Publication Date:
December 22, 2022
Filing Date:
June 15, 2022
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD (JP)
International Classes:
G03F7/004; C07C25/00; C07C211/63; C07C303/32; C07C309/12; C07C381/12; C07D333/52; C07D333/76; G03F7/039
Foreign References:
| JP2021033259A | 2021-03-01 | |||
| JP2021043440A | 2021-03-18 | |||
| JP2021081708A | 2021-05-27 | |||
| JP2020183375A | 2020-11-12 |
Attorney, Agent or Firm:
TAZAKI Akira et al. (JP)
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