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Title:
RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND AND ACID GENERATOR
Document Type and Number:
WIPO Patent Application WO/2022/225019
Kind Code:
A1
Abstract:
A resist composition containing a base component (A) and a compound (B0) represented by general formula (b0) wherein: Rb0 represents a fused ring group containing a fused ring containing one or more aromatic rings, said fused ring group having, as a substituent, an acid degradable group which is decomposed by an acid to form a polar group; Yb0 represents a divalent linking group or a single bond; Vb0 represents a single bond, an alkylene group or a fluoroalkylene group; R0 represents a fluoroalkyl group having 1 to 5 carbon atoms or a fluorine atom; Mm+ represents an m-valent organic cation; and m is an integer of 1 or greater.

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Inventors:
NGUYEN KHANHTIN (JP)
FUJII TATSUYA (JP)
MURATA MARI (JP)
Application Number:
PCT/JP2022/018441
Publication Date:
October 27, 2022
Filing Date:
April 21, 2022
Export Citation:
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Assignee:
TOKYO OHKA KOGYO CO LTD (JP)
International Classes:
C07C309/12; C07C381/12; C09K3/00; G03F7/004; G03F7/039; G03F7/20
Foreign References:
JP2014040387A2014-03-06
JP2021075522A2021-05-20
JP2018028574A2018-02-22
JP2010106236A2010-05-13
Attorney, Agent or Firm:
TAZAKI Akira et al. (JP)
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