Title:
RESIST MATERIAL
Document Type and Number:
WIPO Patent Application WO/2019/021758
Kind Code:
A1
Abstract:
With the purpose of the present invention being to provide a resist material having high coating film smoothness and uniformity, and excellent resolution or other patterning performance, a resist material is provided that contains a calixarene compound (A) having the molecular structure represented by structural formula (1), and a resin component (B). (In the formula: R1 is a perfluoroalkyl group or a structure unit having a perfluoroalkyl group; R2 is a hydrogen atom, a polar group, a polymerizable group, or a structure unit having a polar group or a polymerizable group; R3 is any of a hydrogen atom, an aliphatic hydrocarbon group that may have a substituent group, or an aryl group that may have a substituent group; n is an integer of 2-10; and * is the joining point with an aromatic ring.)
Inventors:
IMADA TOMOYUKI (JP)
YAMAMOTO SHINYA (JP)
MIYAMOTO MASANORI (JP)
YAMAMOTO SHINYA (JP)
MIYAMOTO MASANORI (JP)
Application Number:
PCT/JP2018/025164
Publication Date:
January 31, 2019
Filing Date:
July 03, 2018
Export Citation:
Assignee:
DAINIPPON INK & CHEMICALS (JP)
International Classes:
G03F7/004; C07C323/16; G03F7/023
Domestic Patent References:
| WO2018101057A1 | 2018-06-07 |
Foreign References:
| JP2013079228A | 2013-05-02 | |||
| JP2011033840A | 2011-02-17 | |||
| US20070122734A1 | 2007-05-31 | |||
| JP2009244766A | 2009-10-22 | |||
| JPH10260556A | 1998-09-29 |
Attorney, Agent or Firm:
OGAWA Shinji (JP)
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