Title:
RUTHENIUM COMPOUND, PROCESS FOR PRODUCING SAME, PROCESS FOR PRODUCING RUTHENIUM-CONTAINING THIN FILM USING SAME, AND RUTHENIUM-CONTAINING THIN FILM
Document Type and Number:
WIPO Patent Application WO/2010/074037
Kind Code:
A1
Abstract:
(2,4-Dimethylpentadienyl)(ethylcyclopentadienyl)ruthenium from which a ruthenium-containing thin film can be produced even when the compound contains an analogous compound; a process for producing the ruthenium compound; a process for producing a ruthenium-containing thin film using said compound; and a ruthenium-containing thin film. An analogous compound is separated from (2,4-dimethylpentadienyl)(ethylcyclopentadienyl)ruthenium containing the analogous compound to thereby obtain (2,4-dimethylpentadienyl)(ethylcyclopentadienyl)ruthenium in which the content of the analogous compound is 5 wt.% or lower. This ruthenium compound is used as a raw material to produce a thin film.
Inventors:
FURUKAWA TAISHI (JP)
OSHIMA NORIAKI (JP)
KAWANO KAZUHISA (JP)
CHIBA HIROKAZU (JP)
OSHIMA NORIAKI (JP)
KAWANO KAZUHISA (JP)
CHIBA HIROKAZU (JP)
Application Number:
PCT/JP2009/071256
Publication Date:
July 01, 2010
Filing Date:
December 21, 2009
Export Citation:
Assignee:
TOSOH CORP (JP)
FURUKAWA TAISHI (JP)
OSHIMA NORIAKI (JP)
KAWANO KAZUHISA (JP)
CHIBA HIROKAZU (JP)
FURUKAWA TAISHI (JP)
OSHIMA NORIAKI (JP)
KAWANO KAZUHISA (JP)
CHIBA HIROKAZU (JP)
International Classes:
C07F17/02; C23C16/18; H01L21/28; H01L21/285
Foreign References:
| JP2009007270A | 2009-01-15 | |||
| JP2009228113A | 2009-10-08 | |||
| JP2007526250A | 2007-09-13 | |||
| JP2003342286A | 2003-12-03 | |||
| JP2009269219A | 2009-11-19 |
Other References:
See also references of EP 2371832A4
TOSOH KENKYLGIJUTSU H6KOKU, vol. 47, 2003, pages 61 - 64
APPLIED PHYSICS LETTERS, vol. 83, no. 26, 29 December 2003 (2003-12-29), pages 5506 - 5508
ELECTROCHEMICAL AND SOLID-STATE LETTERS, vol. 6, no. 9, 2003, pages C117 - C119
ELECTROCHEMICAL AND SOLID-STATE LETTERS, vol. 9, no. 7, 2006, pages C107 - C109
ELECTROCHEMICAL AND SOLID-STATE LETTERS, vol. 9, no. 11, 2006, pages C175 - C177
ELECTROCHEMICAL AND SOLID-STATE LETTERS, vol. 10, no. 6, 2007, pages D60 - D62
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 154, no. 2, 2007, pages D95 - D101
MAT. RES. SOC. SYMP. PROC., vol. 748, 2003, pages 111 - 116
INORGANIC CHEMISTRY, vol. 15, no. 2, 1976, pages 466
TOSOH KENKYLGIJUTSU H6KOKU, vol. 47, 2003, pages 61 - 64
APPLIED PHYSICS LETTERS, vol. 83, no. 26, 29 December 2003 (2003-12-29), pages 5506 - 5508
ELECTROCHEMICAL AND SOLID-STATE LETTERS, vol. 6, no. 9, 2003, pages C117 - C119
ELECTROCHEMICAL AND SOLID-STATE LETTERS, vol. 9, no. 7, 2006, pages C107 - C109
ELECTROCHEMICAL AND SOLID-STATE LETTERS, vol. 9, no. 11, 2006, pages C175 - C177
ELECTROCHEMICAL AND SOLID-STATE LETTERS, vol. 10, no. 6, 2007, pages D60 - D62
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 154, no. 2, 2007, pages D95 - D101
MAT. RES. SOC. SYMP. PROC., vol. 748, 2003, pages 111 - 116
INORGANIC CHEMISTRY, vol. 15, no. 2, 1976, pages 466
Attorney, Agent or Firm:
NAITO TERUO (JP)
Teruo Naito (JP)
Teruo Naito (JP)
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