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Patent Searching and Data


Title:
SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2019/031513
Kind Code:
A1
Abstract:
A semiconductor device which comprises: a substrate; a semiconductor element which is arranged on the substrate; a wire which electrically connects the substrate and the semiconductor element with each other; a first sealing layer which seals the space below the tip of the wire; and a second sealing layer which is provided on top of the first sealing layer, with the bonding wire being interposed therebetween. This semiconductor device is configured such that: the first sealing layer is composed of a cured film of a liquid sealing material; and the second sealing layer is composed of a dried coating film of an insulating resin coating material.

Inventors:
SATOH EIICHI (JP)
TAKEMORI DAICHI (JP)
SATO MIZUKI (JP)
TOGAWA MITSUO (JP)
YAMADA KAZUHIKO (JP)
SEKI KOHEI (JP)
Application Number:
PCT/JP2018/029634
Publication Date:
February 14, 2019
Filing Date:
August 07, 2018
Export Citation:
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Assignee:
HITACHI CHEMICAL CO LTD (JP)
International Classes:
H01L23/29; C08G59/20; C08J7/04; C08L63/00; C08L79/08; H01L21/56; H01L23/00; H01L23/31
Domestic Patent References:
WO2014128899A12014-08-28
Foreign References:
JPH10261741A1998-09-29
JPH0574831A1993-03-26
JPH10120878A1998-05-12
JP2011035334A2011-02-17
JP2013166925A2013-08-29
JPH02289646A1990-11-29
JP6292334B12018-03-14
Attorney, Agent or Firm:
MIYOSHI Hidekazu et al. (JP)
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