Title:
SEMICONDUCTOR WAFER TREATMENT LIQUID CONTAINING HYPOCHLORITE IONS AND PH BUFFER
Document Type and Number:
WIPO Patent Application WO/2020/166676
Kind Code:
A1
Abstract:
The present invention provides a treatment liquid for treating a semiconductor wafer in a semiconductor formation process, wherein the treatment liquid contains (A) hypochlorite ions, (B) a pH buffer, and (C) tetraalkylammonium ions represented by formula (1) (in the formula, R1, R2, R3, and R4 each independently are C1-20 alkyl groups).
Inventors:
SHIMODA TAKAFUMI (JP)
KIKKAWA YUKI (JP)
NEGISHI TAKAYUKI (JP)
TOUNO SEIJI (JP)
SATO TOMOAKI (JP)
KIKKAWA YUKI (JP)
NEGISHI TAKAYUKI (JP)
TOUNO SEIJI (JP)
SATO TOMOAKI (JP)
Application Number:
PCT/JP2020/005655
Publication Date:
August 20, 2020
Filing Date:
February 13, 2020
Export Citation:
Assignee:
TOKUYAMA CORP (JP)
International Classes:
H01L21/306
Domestic Patent References:
| WO2011074601A1 | 2011-06-23 | |||
| WO2016140246A1 | 2016-09-09 |
Foreign References:
| JP2009530853A | 2009-08-27 | |||
| US20090124082A1 | 2009-05-14 | |||
| JP2009514219A | 2009-04-02 | |||
| JP2008547202A | 2008-12-25 | |||
| US201715585704A | 2017-05-03 |
Other References:
NOTIFICATION OF THE MINISTRY OF HEALTH, LABOR AND WELFARE, no. 318, 11 March 2005 (2005-03-11)
See also references of EP 3926663A4
See also references of EP 3926663A4
Attorney, Agent or Firm:
IP FIRM SHUWA (JP)
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