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Title:
SHIELD LAYER, METHOD FOR PRODUCING SHIELD LAYER, AND OXIDE SPUTTERING TARGET
Document Type and Number:
WIPO Patent Application WO/2019/208240
Kind Code:
A1
Abstract:
Provided is a shield layer (20) disposed on a liquid-crystal display panel (10) and characterized by comprising an oxide that contains, using 100 atom% for the total of the metal components, In in the range of 60 to 80 atom% with the balance being Si and unavoidable impurity metal elements. The shield layer (20) may also contain Zr in the range of 1 to 32 atom% using 100 atom% for the total of the metal components.

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Inventors:
MORI RIE (JP)
YAMAGUCHI GO (JP)
Application Number:
PCT/JP2019/015779
Publication Date:
October 31, 2019
Filing Date:
April 11, 2019
Export Citation:
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Assignee:
MITSUBISHI MATERIALS CORP (JP)
International Classes:
C23C14/08; C04B35/01; C23C14/34; G02B1/16; G06F3/041; H05K9/00
Foreign References:
JPH11322413A1999-11-24
JP2015013778A2015-01-22
JP2007273455A2007-10-18
JP2018040032A2018-03-15
Attorney, Agent or Firm:
MATSUNUMA Yasushi et al. (JP)
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