Title:
SILICA PARTICLES, METHOD FOR PRODUCING SAME, SILICA SOL, POLISHING COMPOSITION, POLISHING METHOD, METHOD FOR PRODUCING SEMICONDUCTOR WAFER, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/248951
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide: silica particles which has excellent mechanical strength, polishing characteristics and storage stability; a silica sol; and a polishing composition. The present invention relates to silica particles which have an average pore volume of atomic-scale pores of 0.35 nm3 or more as determined by a positron annihilation method.
Inventors:
SHIMADA YUTA (JP)
Application Number:
PCT/JP2023/022446
Publication Date:
December 28, 2023
Filing Date:
June 16, 2023
Export Citation:
Assignee:
MITSUBISHI CHEM CORP (JP)
International Classes:
C01B33/145; B24B37/00; C01B33/18; H01L21/304
Domestic Patent References:
| WO2021153502A1 | 2021-08-05 | |||
| WO2015087965A1 | 2015-06-18 |
Foreign References:
| JP2021116225A | 2021-08-10 | |||
| JP2021147267A | 2021-09-27 | |||
| JP2000208451A | 2000-07-28 | |||
| JP2009215088A | 2009-09-24 | |||
| JP2005060217A | 2005-03-10 | |||
| JP2021054684A | 2021-04-08 | |||
| JP2018167999A | 2018-11-01 | |||
| US4897549A | 1990-01-30 |
Other References:
KAJCSOS, Z. DUPLATRE, G. LISZKAY, L. BILLARD, I. BONNENFANT, A. AZENHA, E. LAZAR, K. PAL-BORBELY, G. CAULLET, P. : "On the peculiarities of positron annihilation features in silicalite-1 and Y-zeolites", RADIATION PHYSICS AND CHEMISTRY, ELSEVIER, AMSTERDAM, NL, vol. 58, no. 5-6, 1 June 2000 (2000-06-01), AMSTERDAM, NL , pages 709 - 714, XP004206961, ISSN: 0969-806X, DOI: 10.1016/S0969-806X(00)00244-9
DUTTA DHANADEEP, GANGULY BICHITRA, CHATTERJEE SUJIB, MUKHERJEE TAPAS: "Effect of Temperature on Positronium Annihilation in Silica Gel", JOURNAL OF PHYSICAL CHEMISTRY PART B, AMERICAN CHEMICAL SOCIETY, US, vol. 109, no. 20, 1 May 2005 (2005-05-01), US , pages 10092 - 10095, XP093119754, ISSN: 1520-6106, DOI: 10.1021/jp050380g
DUTTA D.; CHATTERJEE S.; PILLAI K.T.; PUJARI P.K.; GANGULY B.N.: "Pore structure of silica gel: a comparative study through BET and PALS", CHEMICAL PHYSICS, NORTH-HOLLAND, NL, vol. 312, no. 1, 1 January 1900 (1900-01-01), NL , pages 319 - 324, XP029185831, ISSN: 0301-0104, DOI: 10.1016/j.chemphys.2004.12.008
DUTTA DHANADEEP, GANGULY BICHITRA, CHATTERJEE SUJIB, MUKHERJEE TAPAS: "Effect of Temperature on Positronium Annihilation in Silica Gel", JOURNAL OF PHYSICAL CHEMISTRY PART B, AMERICAN CHEMICAL SOCIETY, US, vol. 109, no. 20, 1 May 2005 (2005-05-01), US , pages 10092 - 10095, XP093119754, ISSN: 1520-6106, DOI: 10.1021/jp050380g
DUTTA D.; CHATTERJEE S.; PILLAI K.T.; PUJARI P.K.; GANGULY B.N.: "Pore structure of silica gel: a comparative study through BET and PALS", CHEMICAL PHYSICS, NORTH-HOLLAND, NL, vol. 312, no. 1, 1 January 1900 (1900-01-01), NL , pages 319 - 324, XP029185831, ISSN: 0301-0104, DOI: 10.1016/j.chemphys.2004.12.008
Attorney, Agent or Firm:
EIKOH, P.C. (JP)
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