Title:
SILICON OXIDE GEL DISPERSION, TRANSPARENT LOW-REFRACTIVE-INDEX FILM, AND METHOD FOR MANUFACTURING SILICON OXIDE GEL DISPERSION
Document Type and Number:
WIPO Patent Application WO/2024/058165
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a silicon oxide gel dispersion that has excellent ease of handling. The present invention is a silicon oxide gel dispersion that includes a silicon oxide gel and a solvent, wherein the viscosity of the dispersion is 10-2000 mPa∙s when the solid content concentration thereof is 3.0 ±0.1 mass%.
Inventors:
SHIOTANI YOSHIYUKI (JP)
OKUBO YOHEI (JP)
YAO TOMOYUKI (JP)
IZUTSU RYOTA (JP)
HATTORI DAISUKE (JP)
MORISHIMA RYOTA (JP)
SATO KEISUKE (JP)
OKUBO YOHEI (JP)
YAO TOMOYUKI (JP)
IZUTSU RYOTA (JP)
HATTORI DAISUKE (JP)
MORISHIMA RYOTA (JP)
SATO KEISUKE (JP)
Application Number:
PCT/JP2023/033175
Publication Date:
March 21, 2024
Filing Date:
September 12, 2023
Export Citation:
Assignee:
NIPPON CATALYTIC CHEM IND (JP)
NITTO DENKO CORP (JP)
NITTO DENKO CORP (JP)
International Classes:
G02B1/111; C01B33/145; C01B33/157; C08J3/02; C08L83/04; C09D7/20; C09D183/04; G02B1/04
Domestic Patent References:
| WO2017057331A1 | 2017-04-06 | |||
| WO2018142813A1 | 2018-08-09 | |||
| WO2019065803A1 | 2019-04-04 |
Foreign References:
| JP2017057116A | 2017-03-23 |
Attorney, Agent or Firm:
WISEPLUS IP FIRM (JP)
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