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Title:
SILOXANE RESIN COMPOSITION AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2007/049440
Kind Code:
A1
Abstract:
Disclosed is a siloxane resin composition which can be applied over a substrate having a step without producing coating unevenness, while exhibiting good coverage of a foundation step. The siloxane resin composition contains a siloxane compound and 1-t-butoxy-2-propanol.

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JP2006055700METHOD FOR FORMING SILICA BASED HARDENED COATING FILM, LIQUID FOR IMPROVING SILICA BASED HARDENED COATING FILM, SILICA BASED HARDENED COATING FILM AND ELECTRONIC COMPONENT
JPH07103238[Title of Invention] Method for Producing Polyorganosylsesquioxane Fine Particles
Inventors:
NIWA HIROYUKI (JP)
HOSONO HIROSHI (JP)
SUWA MITSUHITO (JP)
Application Number:
PCT/JP2006/319927
Publication Date:
May 03, 2007
Filing Date:
October 05, 2006
Export Citation:
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Assignee:
TORAY INDUSTRIES (JP)
NIWA HIROYUKI (JP)
HOSONO HIROSHI (JP)
SUWA MITSUHITO (JP)
International Classes:
C08G77/06; C08L83/04; C08K5/06; C09D183/04; G02B1/04; G02B3/00; G03F7/075
Domestic Patent References:
WO2004009505A12004-01-29
Foreign References:
JPH10219235A1998-08-18
JP2001294811A2001-10-23
JP2004312004A2004-11-04
JPH10133370A1998-05-22
JPH10282325A1998-10-23
JP2006178436A2006-07-06
JP2006276598A2006-10-12
JP2006293337A2006-10-26
Other References:
See also references of EP 1942150A4
Attorney, Agent or Firm:
IWAMI, Tomonori (TORAY INDUSTRIES INC.,, 1-1, Sonoyama 1-chome,, Otsu-sh, Shiga58, JP)
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