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Patent Searching and Data


Title:
SIMULTANEOUS SAMPLE MODIFICATION AND MONITORING
Document Type and Number:
WIPO Patent Application WO/2010/135444
Kind Code:
A3
Abstract:
Systems (100, 200) and methods for simultaneously modifying a sample (154) and monitoring sample modification. In some embodiments, a single charged particle beam (122) is used to simultaneously monitor and modify the sample. In certain embodiments, one charged particle beam is used to monitor the sample while a different charged particle beam (132) is used to simultaneously modify the sample.

Inventors:
KNIPPELMEYER RAINER (US)
SANFORD COLIN A (US)
SCIPIONI LAWRENCE (US)
THOMPSON WILLIAM B (US)
Application Number:
PCT/US2010/035433
Publication Date:
April 07, 2011
Filing Date:
May 19, 2010
Export Citation:
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Assignee:
ZEISS CARL NTS LLC (US)
KNIPPELMEYER RAINER (US)
SANFORD COLIN A (US)
SCIPIONI LAWRENCE (US)
THOMPSON WILLIAM B (US)
International Classes:
H01J37/305
Foreign References:
US20070158558A12007-07-12
US5055696A1991-10-08
EP2031633A12009-03-04
US20020066863A12002-06-06
US3622782A1971-11-23
Other References:
LUCILLE A GIANNUZZI ET AL: "Introduction to Focused Ion Beams, FIB-SIMS, QUANTITATIVE THREE-DIMENSIONAL ANALYSIS USING FOCUSED ION BEAM MICROSCOPY", 1 January 2005, INTRODUCTION TO FOCUSED ION BEAMS : INSTRUMENTATION, THEORY, TECHNIQUES AND PRACTICE, SPRINGER, NEW YORK, US, PAGE(S) 276 - 280,281, ISBN: 978-0-387-23116-7, XP002540689
PREWETT P D ET AL: "Microcircuit machining using focused ion beams-a note on the role of SIMS for end point detection", MICROELECTRONIC ENGINEERING, ELSEVIER PUBLISHERS BV., AMSTERDAM, NL LNKD- DOI:10.1016/0167-9317(89)90138-X, vol. 10, no. 1, 1 September 1989 (1989-09-01), pages 1 - 9, XP024739618, ISSN: 0167-9317, [retrieved on 19890901]
Attorney, Agent or Firm:
DALEY, Sean P. (P.O. Box 1022Minneapolis, Minnesota, US)
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