Title:
SOURCE RF POWER SPLIT INNER COIL TO IMPROVE BCD AND ETCH DEPTH PERFORMANCE
Document Type and Number:
WIPO Patent Application WO/2016/201612
Kind Code:
A1
Abstract:
A coil assembly comprises two or more coils, each of the two or more coils winds from a first end radially outward to a second end, the first ends of the two or more coils are joined together, and the second ends of the two or more coils are positioned at equal intervals. Also provided are an etch reactor comprsing a coil assembly and a method for forming a trench using the etch reactor.
Inventors:
REN RUIZHE (CN)
WANG RONGPING (US)
FARR JON C (US)
MANGALORE CHETHAN (IN)
DEMONTE PETER (US)
BALAKRISHNA PARTHIBAN (IN)
WANG RONGPING (US)
FARR JON C (US)
MANGALORE CHETHAN (IN)
DEMONTE PETER (US)
BALAKRISHNA PARTHIBAN (IN)
Application Number:
PCT/CN2015/081502
Publication Date:
December 22, 2016
Filing Date:
June 15, 2015
Export Citation:
Assignee:
APPLIED MATERIALS INC (US)
REN RUIZHE (CN)
REN RUIZHE (CN)
International Classes:
C23C16/513
Foreign References:
| US5753044A | 1998-05-19 | |||
| US20090314434A1 | 2009-12-24 | |||
| US20050224182A1 | 2005-10-13 | |||
| CN101543141A | 2009-09-23 |
Attorney, Agent or Firm:
LECOME INTELLECTUAL PROPERTY AGENT LTD (CN)
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