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Patent Searching and Data


Title:
STEREOLITHOGRAPHY DEVICE AND STRUCTURE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2022/137640
Kind Code:
A1
Abstract:
The present invention reduces the potential for a structure comprising a cured photocurable resin to adhere to the bottom plate of a container while reliably progressing with the curing of the photocurable resin between the bottom plate of the container and the bottom surface of a holder. A stereolithography device (1) comprises: a container (11) that stores a photocurable resin (RL) prior to curing and has a bottom plate (111) having optical transparency; a holder (12) that is immersed in the photocurable resin (RL); a reactive light irradiation part (13) that irradiates reactive light, which has the action of promoting curing of the photocurable resin (RL), such that the reactive light passes through a boundary surface (BS) between the bottom plate (111) and the photocurable resin (RL); and an inhibiting light irradiation part (14) that irradiates inhibiting light, which has the action of inhibiting curing of the photocurable resin (RL), such that the inhibiting light is completely reflected at the boundary surface (BS).

Inventors:
YAMAGISHI HIROYUKI (JP)
Application Number:
PCT/JP2021/030142
Publication Date:
June 30, 2022
Filing Date:
August 18, 2021
Export Citation:
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Assignee:
FUJIKURA LTD (JP)
International Classes:
B33Y10/00; B29C64/124; B29C64/255; B29C64/277; B33Y30/00; G02B5/18
Domestic Patent References:
WO2017104368A12017-06-22
WO2020180254A12020-09-10
WO2020064779A12020-04-02
Foreign References:
JP2020066236A2020-04-30
US20110039213A12011-02-17
US9453142B22016-09-27
US10471699B22019-11-12
US8697346B22014-04-15
Attorney, Agent or Firm:
HARAKENZO WORLD PATENT & TRADEMARK (JP)
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