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Patent Searching and Data


Title:
STRUCTURE PRODUCTION METHOD, COLOR FILTER PRODUCTION METHOD, SOLID STATE IMAGING ELEMENT PRODUCTION METHOD, AND IMAGE DISPLAY DEVICE PRODUCTION METHOD
Document Type and Number:
WIPO Patent Application WO/2020/179648
Kind Code:
A1
Abstract:
A structure production method including: coating a coloring photosensitive composition over a support provided with a plurality of regions divided by partition walls, to form a coloring photosensitive composition layer over the support including the interior of the regions divided by the partition walls; exposing the coloring photosensitive composition layer formed above the support to light in a patterned manner; and using a development solution to develop/eliminate the coloring photosensitive composition layer in the non-exposed portions, to form pixels in the interior of the regions divided by the partition walls. The development solution is formed from an alkali water solution containing 0.02 to 0.22% by mass of an alkaline agent and a chelator. Also provided are a color filter production method, a solid state imaging element production method, and an image display device production method, which comprise the structure production method.

Inventors:
TAGUCHI YOSHINORI (JP)
Application Number:
PCT/JP2020/008209
Publication Date:
September 10, 2020
Filing Date:
February 28, 2020
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/004; G02B5/20; G02F1/1335; G03F7/027; G03F7/038; G03F7/11; G03F7/32; H01L27/146
Foreign References:
JP2001312072A2001-11-09
JPH11305451A1999-11-05
JP2003021918A2003-01-24
Attorney, Agent or Firm:
SIKs & Co. (JP)
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