Title:
SUBSTRATE FOR MASK BLANK, SUBSTRATE WITH CONDUCTIVE FILM, SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/196555
Kind Code:
A1
Abstract:
Provided is a substrate which is for a mask blank and of which the surface shape can be accurately calculated after being set on a mask stage of an exposure device. A substrate 10 for a mask blank comprises: a first main surface 12a which is a surface having a transfer pattern formed thereon; and a second main surface 12b which faces the first main surface 12a and is a surface on a side that is electrostatically chucked to a mask stage of an exposure device. The first main surface 12a includes a first region 20a located on the center side and a second region 20b located outside the first region 20a. The second main surface 12b includes a third region 20c located on the center side and a fourth region 20d located outside the third region 20c. An angle α formed by the plane having the least squares of the first region 20a and the plane having the least squares of the third region 20c is less than 1.
2°.
The PV values of the surfaces of the second region 20b and the fourth region 20d are 400 nm or less.
Inventors:
NARAHARA HIDEAKI (JP)
Application Number:
PCT/JP2020/013139
Publication Date:
October 01, 2020
Filing Date:
March 24, 2020
Export Citation:
Assignee:
HOYA CORP (JP)
International Classes:
G03F1/24; C03C17/36; G03F1/60
Foreign References:
| JP2017107007A | 2017-06-15 | |||
| JP2005301304A | 2005-10-27 | |||
| JP2011141536A | 2011-07-21 | |||
| JP2016038573A | 2016-03-22 | |||
| JP2012009833A | 2012-01-12 | |||
| JP2004029735A | 2004-01-29 |
Attorney, Agent or Firm:
TSUKUNI & ASSOCIATES et al. (JP)
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