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Title:
SUBSTRATE PROCESSING APPARATUS, INSPECTION METHOD THEREFOR, AND SUBSTRATE PROCESSING SYSTEM
Document Type and Number:
WIPO Patent Application WO/2023/189894
Kind Code:
A1
Abstract:
This substrate processing apparatus comprises: a substrate holding unit that holds and rotates a substrate, the substrate holding unit comprising a plate that faces a lower surface of the substrate with a gap provided between the plate and the lower surface of the substrate, and a holder provided on the plate to directly hold the substrate; an upper nozzle and a lower nozzle that supply a processing liquid to the substrate; a liquid-receiving cup; and a control unit that includes a determination unit which, on the basis of image data acquired from an image capture that captures an image including one or more of the lower nozzle, the plate, and the liquid-receiving cup, determines if there is anomaly in an image capture region. The determination unit, with respect to each of a plurality of divided image data items obtained by dividing the image into a plurality of regions, compares gray scale data in divided image data of a normal state which is prepared in advance, with gray scale data in the divided image data for determination that has been captured, and determines that there is anomaly if the difference between the images exceeds a predetermined reference.

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Inventors:
LEE SUGUEN (JP)
Application Number:
PCT/JP2023/011103
Publication Date:
October 05, 2023
Filing Date:
March 22, 2023
Export Citation:
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Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01L21/304; H01L21/306
Domestic Patent References:
WO2021029274A12021-02-18
WO2019229900A12019-12-05
Foreign References:
JP2013110270A2013-06-06
JP2019102784A2019-06-24
JP2018056223A2018-04-05
JP2000156362A2000-06-06
JP2015046461A2015-03-12
JP2015035474A2015-02-19
JP2018037448A2018-03-08
JP2015118646A2015-06-25
JP2007149892A2007-06-14
JP2019125634A2019-07-25
JP2021190511A2021-12-13
Attorney, Agent or Firm:
MIYAJIMA Manabu et al. (JP)
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