Title:
SUBSTRATE PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/091001
Kind Code:
A1
Abstract:
The purpose of the present invention is to suppress rotation of a substrate. This substrate processing device is provided with a holder 52a for holding from above substrates W which are held from below in holding grooves 1321 provided in a holding bar 132 of a lifter 13 disposed in a processing position of an inner bath 501.
Inventors:
TAKECHI KEI (JP)
TAKAHASHI TOMOHIRO (JP)
SASAKI MITSUTOSHI (JP)
AKIYAMA TAKASHI (JP)
TAKAHASHI TOMOHIRO (JP)
SASAKI MITSUTOSHI (JP)
AKIYAMA TAKASHI (JP)
Application Number:
PCT/JP2019/042890
Publication Date:
May 07, 2020
Filing Date:
October 31, 2019
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD (JP)
International Classes:
H01L21/683; H01L21/304; H01L21/306
Foreign References:
| US6318389B1 | 2001-11-20 | |||
| JP2011100969A | 2011-05-19 | |||
| JP2005225577A | 2005-08-25 | |||
| JP2000012672A | 2000-01-14 |
Attorney, Agent or Firm:
IP FIRM SHUWA (JP)
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