Title:
SUBSTRATE, SELECTIVE METHOD FOR ACCUMULATING FILM ON METAL SURFACE REGION OF SUBSTRATE, ACCUMULATED FILM OF ORGANIC MATTER, AND ORGANIC MATTER
Document Type and Number:
WIPO Patent Application WO/2020/009048
Kind Code:
A1
Abstract:
This selective method for accumulating a film on a metal surface region of a substrate is characterized in that a film of organic matter represented by general formula (1) is selectively accumulated on a substrate having a structure in which both of a first surface region that includes metal and a second surface region that includes a non-metal inorganic material and/or a metal oxide are exposed, the film being accumulated to a greater extent in the first surface region than in the second surface region. (In general formula (1), N represents a nitrogen atom, and X represents an oxygen atom or a sulfur atom. R1 represents a C2-12 hydrocarbon group that may have a hetero atom or a halogen atom, and R2, R3, and R4 each independently represent a hydrogen atom or a C1-10 hydrocarbon group that may have a hetero atom or a halogen atom. In the case of a C3 or higher hydrocarbon group, a branched or cyclic hydrocarbon group is also included.)
Inventors:
YAMAMOTO JUNKI (JP)
SHINMEN MASUTAKA (JP)
MASUDA TAKASHI (JP)
NADANO RYO (JP)
MIYAZAKI TATSUO (JP)
SHINMEN MASUTAKA (JP)
MASUDA TAKASHI (JP)
NADANO RYO (JP)
MIYAZAKI TATSUO (JP)
Application Number:
PCT/JP2019/026014
Publication Date:
January 09, 2020
Filing Date:
July 01, 2019
Export Citation:
Assignee:
CENTRAL GLASS CO LTD (JP)
International Classes:
C23C26/00
Foreign References:
| JP2017021014A | 2017-01-26 | |||
| JP2001189296A | 2001-07-10 |
Attorney, Agent or Firm:
YASUTOMI & ASSOCIATES (JP)
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