Title:
SUBSTRATE-TREATING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2013/191421
Kind Code:
A1
Abstract:
Disclosed is a substrate-treating apparatus. The disclosed substrate-treating apparatus comprises: a spin unit for spinning a substrate supported thereon; a first supply unit for supplying a first fluid to the substrate; a heating unit for heating the substrate and the first fluid supplied by the first supply unit by means of radiant heat; and a swing unit for pivoting the first supply unit and the heating unit.
Inventors:
JUNG KWANG IL (KR)
CHANG BUM SOO (KR)
CHO YOUN SUN (KR)
PARK JI HO (KR)
CHANG BUM SOO (KR)
CHO YOUN SUN (KR)
PARK JI HO (KR)
Application Number:
PCT/KR2013/005319
Publication Date:
December 27, 2013
Filing Date:
June 17, 2013
Export Citation:
Assignee:
ZEUS CO LTD (KR)
International Classes:
H01L21/302
Foreign References:
| US20080268553A1 | 2008-10-30 | |||
| KR20090093835A | 2009-09-02 | |||
| JP2001085383A | 2001-03-30 | |||
| KR100757417B1 | 2007-09-11 |
Attorney, Agent or Firm:
AJU KIM CHANG & LEE (KR)
특허법인아주양헌 (KR)
특허법인아주양헌 (KR)
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