Title:
SULFONIUM SALT, PHOTOACID GENERATOR, CURABLE COMPOSITION, AND RESIST COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2017/212963
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a novel sulfonium salt having high photosensitivity to the i-line. The sulfonium salt according to the present invention is represented by formula (1). [In the formula, R1-R8 each independently represent an alkyl group, a hydroxyl group, an alkoxy group, an aryl group, an aryloxy group, a hydroxy(poly)alkyleneoxy group, a cyano group, a nitro group, a halogen atom, or a hydrogen atom, and R9-R14 each independently represent an alkyl group, a hydroxyl group, an alkoxy group, an aryl group, an aryloxy group, a hydroxy(poly)alkyleneoxy group, a cyano group, a nitro group, or a halogen atom. n1-n4 represent an integer of 0 or 1 (note that zero indicates a direct bond between rings), m1-m6 respectively represent the total numbers of R9-R14, m1, m4, and m6 represent an integer of 0-4, m2 and m5 represent an integer of 0-3, m3 represents an integer of 0-5, and X- represents a monovalent polyatomic anion.]
Inventors:
TAKASHIMA YUSAKU (JP)
NAKAO TAKUTO (JP)
KIMURA HIDEKI (JP)
SHIBAGAKI TOMOYUKI (JP)
SHIRAISHI ATSUSHI (JP)
NAKAO TAKUTO (JP)
KIMURA HIDEKI (JP)
SHIBAGAKI TOMOYUKI (JP)
SHIRAISHI ATSUSHI (JP)
Application Number:
PCT/JP2017/019855
Publication Date:
December 14, 2017
Filing Date:
May 29, 2017
Export Citation:
Assignee:
SAN-APRO LTD (JP)
International Classes:
C07C381/12; C08G59/68; C08K5/375; C08L25/18; C08L33/00; C08L61/04; C09K3/00; G03F7/004; G03F7/038; G03F7/039
Domestic Patent References:
| WO2009020089A1 | 2009-02-12 |
Foreign References:
| JP2009269849A | 2009-11-19 | |||
| JP2011201803A | 2011-10-13 | |||
| JP2011180586A | 2011-09-15 | |||
| JP2012141578A | 2012-07-26 | |||
| JP2013178492A | 2013-09-09 | |||
| JP2014205624A | 2014-10-30 |
Attorney, Agent or Firm:
HAYASHI Hiroshi (JP)
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