Title:
SYSTEM AND METHOD FOR LITHOGRAPHY SIMULATION
Document Type and Number:
WIPO Patent Application WO2005040917
Kind Code:
A3
Abstract:
There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/or systems, and/or individual functions performed thereby or components used therein. In one embodiment, the present invention is a system and method that accelerates lithography simulation, inspection, characterization and/or evaluation of the optical characteristics and/or properties, as well as the effects and/or interactions of lithographic systems and processing techniques. In this regard, in one embodiment, the present invention employs a lithography simulation system architecture (110), including application-specific hardware accelerators (116a 116n), and a processing technique to accelerate and facilitate verification, characterization and/or inspection of a mask design, for example, RET design, including detailed simulation and characterization of the entire lithography process to verify that the design achieves and/or provides the desired results on final wafer pattern. The system (110) includes: general purpose-type computing device(s) (114a, 142a, 142b) to perform the case-based logic having branches and interdependency in the data handling and accelerator subsystems (146a1 146ax, , 146n1 146nx) to perform a majority of the computation intensive tasks.
Inventors:
YE JUN (US)
LU YEN-WEN (US)
CAO YU (US)
CHEN LUOQI (US)
CHEN XUN (US)
LU YEN-WEN (US)
CAO YU (US)
CHEN LUOQI (US)
CHEN XUN (US)
Application Number:
PCT/US2004/028864
Publication Date:
February 23, 2006
Filing Date:
September 07, 2004
Export Citation:
Assignee:
BRION TECH INC (US)
YE JUN (US)
LU YEN-WEN (US)
CAO YU (US)
CHEN LUOQI (US)
CHEN XUN (US)
YE JUN (US)
LU YEN-WEN (US)
CAO YU (US)
CHEN LUOQI (US)
CHEN XUN (US)
International Classes:
G03B27/54; G03F1/88; G03F7/20; G06F17/50; G06K9/00; G06T7/00; G16Z99/00; G03F; (IPC1-7): G06F17/50; G06F19/00; G06K9/36; G06K9/20; G03F1/02
Foreign References:
| US5680588A | 1997-10-21 | |||
| US5594850A | 1997-01-14 | |||
| US6285488B1 | 2001-09-04 | |||
| US6372391B1 | 2002-04-16 | |||
| US20030107770A1 | 2003-06-12 | |||
| US20040022354A1 | 2004-02-05 |
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