Title:
TEMPERATURE MEASURING DEVICE, THERMAL TREATMENT DEVICE USING THE SAME, TEMPERATURE MEASURING METHOD
Document Type and Number:
WIPO Patent Application WO/2007/004644
Kind Code:
A1
Abstract:
There are provided a temperature measuring device, method, and a thermal treatment device
which are appropriately used for measuring a temperature of a substrate subjected
to thermal treatment performing rapid heating. The temperature measuring device
includes: a light intensity measuring unit for applying a laser beam to an object
to be heated having a uniquely defined correlation between a temperature and
a refractivity and measuring light intensity characteristic X indicating the
relationship between a reflected light or a transmitting light obtained by interference
of laser beams multiply reflected in the object to be heated and the time; a calculation
unit for acquiring a reproduced object to be heated for obtaining a virtual object
to be heated having light intensity characteristic Z nearest to the light intensity
characteristic X obtained from the virtual object to be heated when applying
a thermal load equivalent to the condition of heading the object to be heated and
applying a laser beam having characteristic equivalent to the aforementioned
leaser beam to the virtual object to be heated; and a temperature output unit for
obtaining a temperature of a predetermined portion of the object to be heated
at a predetermined time according to the reproduced object to be heated.
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Inventors:
HIGASHI SEIICHIRO (JP)
Application Number:
PCT/JP2006/313304
Publication Date:
January 11, 2007
Filing Date:
July 04, 2006
Export Citation:
Assignee:
UNIV HIROSHIMA (JP)
HIGASHI SEIICHIRO (JP)
HIGASHI SEIICHIRO (JP)
International Classes:
G01K11/12; G01K13/00; G06F17/30
Domestic Patent References:
| WO2004065923A1 | 2004-08-05 |
Foreign References:
| JPH11190670A | 1999-07-13 | |||
| JP2000162048A | 2000-06-16 | |||
| US5229303A | 1993-07-20 |
Other References:
See also references of EP 1909083A4
DONENELLY V M: "INFRARED-LASER INTERFEROMETRIC THERMOMETRY: A NONINTRUSIVE THECHNIQUE FOR MEASURING SEMICONDUCTOR WAFER TEMPERATURES", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PARRT A AVS/AIP, vol. 8, no. 1, 1 January 1990 (1990-01-01), pages 84 - 92
DONENELLY V M: "INFRARED-LASER INTERFEROMETRIC THERMOMETRY: A NONINTRUSIVE THECHNIQUE FOR MEASURING SEMICONDUCTOR WAFER TEMPERATURES", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PARRT A AVS/AIP, vol. 8, no. 1, 1 January 1990 (1990-01-01), pages 84 - 92
Attorney, Agent or Firm:
TSURUKAME, Kuniyasu (2-36 Kaminoboricho, Naka-k, Hiroshima-shi Hiroshima 14, JP)
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