Title:
THERMAL DIFFUSION DEVICE
Document Type and Number:
WIPO Patent Application WO/2022/230295
Kind Code:
A1
Abstract:
A vapor chamber 1, which is an embodiment of this thermal diffusion device, comprises: a casing 10 having a first inner wall surface 11a and a second inner wall surface 12a that are opposed to each other in a thickness direction; an operating medium 20 enclosed in an inner space of the casing 10; and a wick 30 located in the inner space of the casing 10. The wick 30 extends in a direction perpendicular to the thickness direction and has a portion in contact with the first inner wall surface 11a and the second inner wall surface 12a of the casing 10. A vapor flow channel 50 is formed in the inner space of the casing 10. The planar shape of the casing 10 as viewed in the thickness direction has a first side 61 and a second side 62 that form an interior angle equal to or greater than 180 degrees. In the inner space of the casing 10, further provided is a capillary structure 70 having a first part 71 close to the first side 61 or to the second side 62, and a second part 72 in contact with the wick 30.
Inventors:
NUMOTO TATSUHIRO (JP)
KOJIMA KEIJIRO (JP)
MUKAI TSUYOSHI (JP)
MORIKAMI MASASHI (JP)
KOJIMA KEIJIRO (JP)
MUKAI TSUYOSHI (JP)
MORIKAMI MASASHI (JP)
Application Number:
PCT/JP2022/005061
Publication Date:
November 03, 2022
Filing Date:
February 09, 2022
Export Citation:
Assignee:
MURATA MANUFACTURING CO (JP)
International Classes:
H01L23/427; F28D15/02; F28D15/04; H05K7/20
Foreign References:
| JPH08303971A | 1996-11-22 | |||
| JP2011226743A | 2011-11-10 | |||
| US20170160017A1 | 2017-06-08 | |||
| JP2018185110A | 2018-11-22 | |||
| JP2008153423A | 2008-07-03 | |||
| JP2011085311A | 2011-04-28 | |||
| JP2016023821A | 2016-02-08 |
Attorney, Agent or Firm:
WISEPLUS IP FIRM (JP)
Download PDF: