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Patent Searching and Data


Title:
THERMAL VACUUM DRYING DEVICE FOR FLEXIBLE SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2018/113015
Kind Code:
A1
Abstract:
A thermal vacuum drying device for a flexible substrate. First support pins (5) and second support pins (6) in the thermal vacuum drying device are respectively improved by employing an insertion or nesting structure, thus accelerating heat conduction, and reducing a temperature difference between portions of a substrate (7) that contact the first support pins (5) or the second support pins (6) and portions of the substrate (7) that do not contact the first support pins (5) or the second support pins (6) to enable uniform heating. In this way, the present invention reduces support marks caused by the support pins, and allows a moderate increase of the number of support pins in a middle region, mitigating uneven film thickness caused by sagging of the substrate (7).

Inventors:
ZHANG CHUN (CN)
Application Number:
PCT/CN2016/113030
Publication Date:
June 28, 2018
Filing Date:
December 29, 2016
Export Citation:
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Assignee:
WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO LTD (CN)
International Classes:
B05D3/02; H01L21/68; F26B5/04
Foreign References:
CN105080803A2015-11-25
CN205780150U2016-12-07
CN202796877U2013-03-13
JP2000323556A2000-11-24
CN102633442A2012-08-15
US5665167A1997-09-09
JPH11340309A1999-12-10
JPH0273619A1990-03-13
Attorney, Agent or Firm:
COMIPS INTELLECTUAL PROPERTY OFFICE (CN)
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