Title:
THIN FILM BULK ACOUSTIC RESONATOR AND MANUFACTURING METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2021/189964
Kind Code:
A1
Abstract:
Disclosed in the present invention is a thin film bulk acoustic resonator and a manufacturing method therefor, the thin film bulk acoustic resonator comprising: a first substrate; a support layer bonded on the first substrate, a first empty cavity that runs through the support layer being formed within the support layer; a piezoelectric overlapping layer structure which covers the first empty cavity, the piezoelectric overlapping layer structure, from top to bottom in a sequentially overlapping fashion, comprising a first electrode, a piezoelectric layer, and a second electrode, where in an active resonance area, the first electrode, the piezoelectric layer, and the second electrode overlap in the direction orthogonal to the piezoelectric layer; the first electrode comprises a first lateral face and/or the second electrode comprises a second lateral face, at least a portion of the borders of the active resonance area comprise the first lateral face and/or the second lateral face, and the included angle of the first lateral face and/or second lateral face with a surface of the piezoelectric layer is 85-95 degrees. The present invention is able to improve piezoelectric layer crystal orientation, reduce transverse wave loss, and allow for the improvement of the Q factor of thin film bulk acoustic resonators.
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Inventors:
HUANG HERB HE (CN)
LUO HAILONG (CN)
LI WEI (CN)
LUO HAILONG (CN)
LI WEI (CN)
Application Number:
PCT/CN2020/135656
Publication Date:
September 30, 2021
Filing Date:
December 11, 2020
Export Citation:
Assignee:
NINGBO SEMICONDUCTOR INT CORP (CN)
International Classes:
H03H9/02; H03H9/17
Foreign References:
CN112039477A | 2020-12-04 | |||
CN107809221A | 2018-03-16 | |||
CN110581695A | 2019-12-17 | |||
CN110401428A | 2019-11-01 | |||
CN110611493A | 2019-12-24 | |||
CN108336982A | 2018-07-27 | |||
US20190341906A1 | 2019-11-07 |
Attorney, Agent or Firm:
BEIJING SICHUANG DACHENG INTELLECTUAL PROPERTY AGENCY CO., LTD. (CN)
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