VAPOR DEPOSITION APPARATUS, VAPOR DEPOSITION METHOD, ORGANIC EL ELEMENT, AND ORGANIC EL DISPLAY APPARATUS

WIPO Patent Application WO/2012/098927

A1

First and second vapor deposition particles (91a, 91b) discharged from first and second vapor deposition source openings (61a, 61b) pass through first and second limiting openings (82a, 82b) in a limiting plate unit (80), then, pass through mask openings (71) in a vapor deposition mask (70), and form a film by being deposited on a substrate (10). When regions where the first vapor deposition particles and the second vapor deposition particles are to be deposited, said regions being on the substrate, are set as a first region (92a) and a second region (92b), in the case where it is assumed that there is no vapor deposition mask, the limiting plate unit limits first direction (10a) directivity of the first vapor deposition particles and the second vapor deposition particles traveling toward the substrate such that the second region is included in the first region. Consequently, a light emitting layer using a doping method can be formed by means of vapor deposition separately performed by color.

KAWATO SHINICHI
INOUE SATOSHI
SONODA TOHRU

PCT/JP2012/050031

July 26, 2012

January 04, 2012

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SHARP KK (JP)
KAWATO SHINICHI
INOUE SATOSHI
SONODA TOHRU

C23C14/04; C23C14/24; H01L51/50; H05B33/10

JP2006249572A	2006-09-21
JP2009127066A	2009-06-11
US20090133629A1	2009-05-28
KR20040043360A	2004-05-24
DE102009011696A1	2010-09-23
JP2006057173A	2006-03-02
JP2004137583A	2004-05-13

IKEUCHI SATO & PARTNER PATENT ATTORNEYS (JP)
Patent business corporation Ikeuchi and Sato and partners (JP)

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