Title:
VAPOR DEPOSITION MASK INTERMEDIATE, VAPOR DEPOSITION MASK, AND METHOD FOR MANUFACTURING VAPOR DEPOSITION MASK
Document Type and Number:
WIPO Patent Application WO/2022/014662
Kind Code:
A1
Abstract:
Provided is a vapor deposition mask intermediate formed from a metal sheet, said vapor deposition mask intermediate comprising: a belt-like part that includes a border having first and second long sides and first and second short sides and a mask part provided with a plurality of mask holes; a frame-like part that surrounds the belt-like part; and a connecting part that is positioned between the belt-like part and the frame-like part and that connects at least the first short side of the belt-like part to the frame-like part. The belt-like part is provided with a fragile line, a line segment, and a cutout region. Both ends of the fragile line are connected to the first short side, and the fragile line has a line shape having a shape protruding from the first short side toward the second short side. The line segment is the part of the first short side that is sandwiched between both ends of the fragile line. The cutout region is surrounded by the fragile line and includes the line segment and the fragile line. The cutout region of the vapor deposition mask intermediate is provided with a through hole that is connected to part of the border surrounding the cutout region.
Inventors:
MATSUGUMA KAORI (JP)
HIGUCHI HIROKAZU (JP)
HIGUCHI HIROKAZU (JP)
Application Number:
PCT/JP2021/026563
Publication Date:
January 20, 2022
Filing Date:
July 15, 2021
Export Citation:
Assignee:
TOPPAN INC (JP)
International Classes:
C23C14/04; B26D7/18; C23C14/24; H01L51/50; H05B33/10
Domestic Patent References:
| WO2020050398A1 | 2020-03-12 | |||
| WO2021045137A1 | 2021-03-11 |
Foreign References:
| CN102703857A | 2012-10-03 | |||
| JP2002001694A | 2002-01-08 |
Attorney, Agent or Firm:
ONDA Makoto et al. (JP)
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