Title:
VAPOR PHASE GROWTH DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/131253
Kind Code:
A1
Abstract:
Provided is a vapor phase growth device (1) that is capable of correcting a positional misalignment of a carrier (C) in the rotation direction relative to a wafer (WF) when the vapor phase growth device (1) is viewed in a plan view. The vapor phase growth device (1) comprises a load lock chamber (13) provided with a holder (17) for supporting the carrier (C), wherein the carrier (C) and the holder (17) are provided with a correction mechanism that corrects the position of the carrier (C) in the rotation direction when the vapor phase growth device (1) is viewed in a plan view.
Inventors:
MINAMIDE YU (JP)
Application Number:
PCT/JP2020/038899
Publication Date:
July 01, 2021
Filing Date:
October 15, 2020
Export Citation:
Assignee:
SUMCO CORP (JP)
International Classes:
H01L21/205; C23C16/24; C23C16/458; H01L21/683
Domestic Patent References:
| WO2011114677A1 | 2011-09-22 |
Foreign References:
| JP2002075869A | 2002-03-15 | |||
| JP2009538540A | 2009-11-05 |
Attorney, Agent or Firm:
TOKOSHIE PATENT FIRM (JP)
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