VAPORIZATION SUPPLY METHOD AND VAPORIZATION SUPPLY DEVICE

WIPO Patent Application WO/2021/124723

A1

Provided are a vaporization supply method and a vaporization supply device which can prevent temperature overshooting of a vaporizer upon stopping the supply of a gas, and prevent oversupplying of a liquid material to the vaporizer upon starting the supply of a gas.　The present invention comprises: a vaporizer 2A which heats and vaporizes a liquid raw material L; a flow rate control device 4 which controls a flow rate of a gas supplied to a gas supply destination from the vaporizer 2A; and a controller 5 which heats the inside of the vaporizer 2A in order to obtain a required flow rate of the gas, and performs a feedback control so that the pressure becomes a prescribed value or higher, wherein the controller 5 is configured to stop the feedback control at the time of starting a flow rate control by the flow rate control device 4, heat the liquid raw material L by giving, to the vaporizer 2A , an amount of heat greater than that given immediately before stopping the feedback control, and change the flow rate control to the feedback control, after a certain time has passed from the time when the flow rate control was started by the flow rate control device 4.

HIDAKA ATSUSHI (JP)
MORISAKI KAZUYUKI (JP)
NISHINO KOUJI (JP)
IKEDA NOBUKAZU (JP)

PCT/JP2020/041693

June 24, 2021

November 09, 2020

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FUJIKIN KK (JP)

B01J4/00; C23C16/448; H01L21/205; H01L21/31

JP2016211021A	2016-12-15
JP2011122223A	2011-06-23
JP2019104975A	2019-06-27
JP2002246315A	2002-08-30
JPH08173791A	1996-07-09

TANIDA Ryuichi et al. (JP)

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