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WO/1998/055545A1 |
A soft elastomeric disc for removal of polymeric compositions from an underlying substrate. The disc is useful for removing decorative decals, stripes, graphics, emblems, protective moldings, paint and adhesive and is made from a filled ...
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WO/1998/052717A1 |
A rotary foam buffing pad (10) is provided with a concave working face which allows the operator to provide true graduated surface contact in applying polish, buffing or glazing compounds, while containing the polishing compound against ...
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WO/1998/050198A2 |
Cleaning and polishing automotive panels with a combination pad (8). A support (18) holds a circular replaceable, disposable cleaning/polishing pad (14) on a rotatable power tool. The pad is made of compressible/expandable foam. The pad ...
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WO/1998/050201A1 |
This invention provides polishing pad tiles which, by virtue of their geometry and surface features, can be arranged to form mosaic pads having channels at the seams which facilitate the flow of polishing fluid during polishing of a work...
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WO/1998/047662A1 |
A polishing pad for polishing a semiconductor wafer which includes an open-celled, porous substrate having sintered particles of synthetic resin. The porous substrate is a uniform, continuous and tortuous interconnected network of capill...
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WO/1998/046413A1 |
A method of spin welding a fastener to an article and such an article. In a preferred mode, a method of spin welding a fastener to a surface conditioning treating article is disclosed. The fastener comprises a generally planar base inclu...
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WO/1998/045112A1 |
A polishing pad is provided which is comprised of vertically oriented fibers. Such pads can be produced by electrostatically flocking fibers onto a substrate. Preferably the fibers are hollow.
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WO/1998/045087A1 |
This invention describes improved polishing pads useful in the manufacture of semiconductor devices or the like. The pads of the present invention have an advantageous hydrophilic polishing material and have an innovative surface topogra...
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WO/1998/030129A1 |
A rotary surface treatment tool is attached to a rotational driver with a kit. The surface treatment tool includes a base with a middle portion around a center hole, and one or more attachment knobs are placed on the front side of the mi...
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WO/1998/030362A1 |
System and method for locating and polishing a stain or protrusion on a surface of a vehicle. The stain or protrusion may be located by placing a plastic film between a portion of a human hand and the surface. The stain or protrusion may...
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WO/1998/029205A1 |
The present invention is directed to a process for removing oxidation residue from annealed, cold-rolled stainless steel using abrasive brushes, eliminating the need for pickling the steel. The brushing process also imparts a desired fin...
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WO/1998/029217A1 |
The present invention relates to a method and an article for rapidly polishing a glass workpiece surface using a structured abrasive article including cerium oxide particles dispersed in a binder. The abrasive article for rapid polishing...
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WO/1998/019830A1 |
An abrasive article is formed from a lofty nonwoven abrasive pad and one or more abrasive sheets. In one embodiment, each sheet has an abrasive layer on its front side and a plurality of engagement stems on its back side. Enough of the e...
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WO/1998/019829A1 |
An abrasive article is formed from a lofty nonwoven abrasive pad and one or more abrasive sheets. Each sheet has an abrasive layer on its front side and a plurality of engagement stems on its back side. Enough of the engagement stems eng...
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WO/1998/015384A1 |
A contour indicator that visually indicates non-uniformities in the planarity of the planarizing surface of a polishing pad. In one embodiment of the invention, a polishing pad has a polishing body with a planarizing surface facing the w...
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WO/1998/014304A1 |
A polishing pad (42) for use in chemical-mechanical planarization (CMP) of semiconductor wafers includes a multiplicity of elongated microcolumns (48) embedded in a matrix material body (44). The elongated microcolumns (48) are oriented ...
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WO/1998/012020A1 |
An apparatus for evenly polishing or planarizing the surfaces of workpieces comprising a polishing pad with a plurality of grooves along the surface of the pad for uniformly guiding a slurry radially outward across the surface of the pad...
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WO/1998/006541A1 |
An abrasive construction for modifying a surface of a workpiece, such as a semiconductor wafer. The abrasive construction comprises: a three-dimensional, textured, fixed abrasive element; at least one resilient element generally coextens...
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WO/1998/005472A1 |
The invention concerns a method for the deburring of items, especially metal items (1), which are encumbered with sharp edges or burrs (8) after punching, clipping, moulding and/or machining operations, by which method the items (1) are ...
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WO/1998/003308A1 |
To provide a compact disk holder which is superior in strength and at the same time can completely fit in existing covers. A disk holder (1) including an internal threaded portion (15) into which is able to be screwed an external threade...
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WO/1997/047433A1 |
A lapping pad (31) used to polish wafers in a CMP process comprising a substantially flat surface (32) having relatively few surface irregularities (34). The lapping pad (31) is suitably made from a porous material which permits the adso...
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WO/1997/047434A1 |
A flexible abrasive member comprises a porous layer which carries deposits with embedded abrasive particles, said deposits being separated from each other. The deposits are arranged and shaped in such a way that they are mutually interlo...
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WO/1997/043091A1 |
The present invention relates generally to abrasive stone pads for use in processing workpiece surfaces. The abrasive stones generally are produced by combining a phenolic resin mixture with a diluent and then injecting microballoon stru...
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WO/1997/042003A1 |
A method for making a nonwoven abrasive article. A preferred aspect of the method comprises the steps of: a) providing a nonwoven web having a first side and a second side, the web comprising a plurality of fibers; b) frothing a liquid m...
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WO/1997/042004A1 |
A method for manufacturing a foraminous abrasive article whereby abrasive particles are concentrated in an external surface region of a foraminous substrate. The method includes the steps of: providing a foamable, hardenable, liquid resi...
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WO/1997/042005A1 |
Abrasive articles and a method for the manufacture of such articles are described. The articles comprise a lofty nonwoven web of fibers, the fibers defining a first major web surface, a second major web surface and a middle web portion e...
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WO/1997/040961A1 |
A peening particle support having a plurality of asymmetrically arranged peening particles positioned to minimize tracking on a workpiece. The peening particles are attached to an exposed surface of the peening particle support. The peen...
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WO/1997/038824A1 |
A profiled, soft cushined roller (14) is provided with an outer profiled abrading surface (15) that conforms to and rides on a contoured substrate surface (21) during an abrading operation. A soft roller (14) usually in the form of a sof...
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WO/1997/036835A1 |
A foamed glass article for preparing surfaces, the use therefor, and a method of making same are provided. The foamed glass article is in the form of a block, disk or similar product, and is used for preparing surfaces such as by sanding...
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WO/1997/035688A1 |
A method for manufacturing a sweeper or abrasive element (2) is disclosed. The abrasive element (2) is manufactured from a U-shaped plastic profile (3), in the aperture of which abrasive lamellae (6), supporting bristles (7) and heat-dis...
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WO/1997/027974A1 |
A rotary polishing device by which the number of members which are discarded when the polishing member is worn out is decreased, and hence bad influence upon the environment is curbed. A polishing member holder (11) and a central member ...
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WO/1997/027029A1 |
A process for the manufacture of an abrasive brush of the convolute type, laminate type, flap type or the like is described with an abrasive brush made by such a process. The process comprises the steps of providing a flexible and compre...
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WO/1997/026114A1 |
The present invention is a polishing pad for use in chemical-mechanical planarization of semiconductor wafers, and a method for making the polishing pad. The polishing pad has a body, molecular bonding links, and abrasive particles dispe...
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WO/1997/021521A1 |
Accessories for an angle grinder include a disposable rotary sanding disk having quite large shaped ventilating/viewing apertures, for use with a resilient backing plate also having shaped ventilating apertures. The apertures of one or b...
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WO/1997/021520A1 |
Accessories for an angle grinder include a resilient backing plate for use with an abrasive disk having shaped ventilating and viewing apertures. The apertures of the backing plate correspond to those on the disk and are shaped so that s...
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WO/1997/018060A1 |
The invention relates to a tool for mechanically treating a surface by grinding, polishing, brushing, structuring, smoothing or cleaning. It has an elongated holder element (1) for strip, fibrous, bristle, monofilament, braided or knitte...
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WO/1997/018059A1 |
Surface treating articles and methods for the manufacture of such articles are provided. The articles of the invention comprise a rotatable core; a plurality of surface treating segments, the segments having first ends adjacent the core ...
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WO/1997/014538A1 |
Accessories for an angle grinder include a rotary disk tool having a working zone around the periphery of the disk comprising a plurality of wire bristles and a rest means for supporting the grinder on a surface to be shaped. The rest me...
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WO/1997/014537A1 |
Accessories for an angle grinder include a tool comprising a rotary disk having releasably attached to its surface, an annular attachment having a cutting or abrading, ("shaping"), surface, and rest means in a rest zone for supporting th...
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WO/1997/010925A2 |
An automatic polishing machine (14) for polishing aircraft windows (12) uses pressurized air to create a suction to hold the polishing unit (20) on the aircraft (10), creates a suction to automatically pick up a polish pad (196), which i...
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WO/1997/010613A1 |
A grinding method which uses grindstone comprising abrasive grains and a binding resin for binding the abrasive grains, and a grinding device for use in the same. Grindstone having a desired elastic modulus can be manufactured by means o...
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WO/1997/006921A1 |
A pad is provided for use on a machine for the polishing of silicon wafers which allows the use of optical detection of the wafer surface condition as the wafer is being polished. This is accomplished by constructing the entire pad or a ...
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WO/1997/005991A1 |
An improved star head sanding assembly (10) for sanding on the peripheral edges of the individual abrasive discs (31). The discs are provided with radially arranged non-parallel skip cuts (38), and are devoid of radial cutout sections to...
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WO/1997/000155A1 |
A lapping tool for localised optical polishing of a workpiece, the tool having a flexible working surface and being characterised by means for selectively varying the pressure applied, in use, on the workpiece by different regions of the...
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WO/1996/033638A1 |
The present invention relates to an abrasive brush having a plurality of bristles unitarily moulded with a base, and more particularly to an abrasive brush made by injection moulding a mixture of polymer and abrasive particles. The brush...
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WO/1996/029178A1 |
The invention relates to the field of mechanics and mainly to the field of woodworking tools. In particular, a sanding and stripping device is provided for use in joinery and industry for stripping and planing all kinds of materials. The...
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WO/1996/027480A1 |
An applicator head comprises a pad (20) and a hub element (14). The hub element (14) has on one side a boss (16) for coupling to a rotary drive unit and on the opposite side a surface releasably attached to the pad (20). The pad has a ce...
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WO/1996/018479A1 |
An abrasive flap brush including a central core, a layer of adhesive disposed on the peripheral surface of the core by a coater, and a plurality of abrasive flaps adhered to the core by the adhesive. The adhesive is uniformly distributed...
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WO/1996/016749A1 |
An apparatus for cleaning a buffing pad (13) mounted on a rotary powered buffing machine is adapted to be adjustably mounted by a plurality of support legs within an open container (11) containing a liquid cleaning solution. The buffing ...
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WO/1996/015878A1 |
a compounding element for use with a rubbing compound in the finishing of a working surface. The compounding element has a buffing surface and a resiliently deformable skirt around the perimeter of the buffing surface and projecting beyo...
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