【発明の名称】走査露光方法、走査型露光装置、及び素子製造方法

Title:

【発明の名称】走査露光方法、走査型露光装置、及び素子製造方法

Document Type and Number:

Japanese Patent JP3123524

Kind Code:

B2

More Like This:

JP2011106635	BASE ISOLATING DEVICE AND EXPOSURE DEVICE SYSTEM
JP2003022962	EXPOSING SYSTEM, METHOD FOR FABRICATING DEVICE, FACTORY FOR PRODUCING SEMICONDUCTOR AND METHOD FOR MAINTAINING ALIGNER
JP2008205460	DETERMINATION METHOD, EVALUATION METHOD, EXPOSURE METHOD, EVALUATION APPARATUS, LIQUID-IMMERSION EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD

Inventors:

Kenji Nishi

Application Number:

JP33250198A

Publication Date:

January 15, 2001

Filing Date:

November 24, 1998

Export Citation:

Assignee:

NIKON CORPORATION

International Classes:

G03F7/20; H01L21/027; (IPC1-7): H01L21/027; G03F7/20

Domestic Patent References:

Previous Patent: JPH03123523

Next Patent: JPH03123525