Title:
イオン注入装置
Document Type and Number:
Japanese Patent JP5648919
Kind Code:
B2
Abstract:
The ion implanter includes a deflecting electrode and a shield member. The ion beam has a ribbon shape. The deflecting electrode deflects at least a part of the ion beam in a long side direction toward a short side direction of the ion beam, based on a result measured of a beam current density distribution in the long side direction. The shield member partially shields the ion beam deflected by the deflecting electrode. The deflecting electrode includes a plate electrode and an electrode group including plural electrodes. The electrode group is disposed to face the plate electrode to interpose the ion beam between the plate electrode and the electrode group. The plate electrode is electrically grounded, and the plurality of electrodes are electrically independent from each other. Each of the plurality of electrodes is connected to an independent power source from other power sources to perform a potential setting.
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Inventors:
内藤 勝男
Application Number:
JP2011178472A
Publication Date:
January 07, 2015
Filing Date:
August 17, 2011
Export Citation:
Assignee:
日新イオン機器株式会社
International Classes:
H01J37/317; H01J37/09; H01J37/147; H01L21/265