Admiration active light nature or a radiation-sensitive resin composition, admiration active light nature or a radiation-sensitive film, and a pattern formation method

Title:

Admiration active light nature or a radiation-sensitive resin composition, admiration active light nature or a radiation-sensitive film, and a pattern formation method

Document Type and Number:

Japanese Patent JP6007100

Kind Code:

B2

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Inventors:

Takeshi Kawabata
Hiroo Takizawa
Akinori Shibuya
Kenyo Goto
Masashi Kojima
Keita Kato

Application Number:

JP2012284642A

Publication Date:

October 12, 2016

Filing Date:

December 27, 2012

Export Citation:

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Assignee:

FUJIFILM Corporation

International Classes:

G03F7/004; C07C25/00; C07C309/07; C07C309/12; C07C309/17; C07C311/48; C07C317/44; C07C381/12; G03F7/038; G03F7/039

Domestic Patent References:

JP2011221501A
JP2006162735A
JP2003327572A
JP2013083944A

Foreign References:

WO2012096264A1
WO2012023374A1

Attorney, Agent or Firm:

Kurata Masatoshi
Nobuhisa Nogawa
Naoki Kono
Tadashi Inoue
Ukai Ken
Shigeru Iino

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