Title:
CLEANING METHOD OF STORAGE CONTAINER OF PRECISION SUBSTRATE AND MANUFACTURING METHOD OF STORAGE CONTAINER
Document Type and Number:
Japanese Patent JP2014072399
Kind Code:
A
Abstract:
To provide a cleaning method capable of obtaining a storage container of a precision substrate, such as a photomask blank, which includes an antistatic function after cleaning, and to provide a manufacturing method of the storage container of the precision substrate which achieves the antistatic function.
A cleaning method of a storage container of a precision substrate is a method for cleaning the container which stores the precision substrate. In the cleaning method, a surface active agent is used to form a coat composed of the surface active agent on a surface of the storage container during cleaning of the storage container and cleaning is performed so that the coat is left after the cleaning.
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Inventors:
SAKAZUME TAKURO
NAKAGAWA HIDEO
NAKAGAWA HIDEO
Application Number:
JP2012217794A
Publication Date:
April 21, 2014
Filing Date:
September 28, 2012
Export Citation:
Assignee:
SHINETSU CHEMICAL CO
International Classes:
H01L21/304; B08B3/04; B08B3/10; B08B9/22; H01L21/673
Domestic Patent References:
JP2004323064A | 2004-11-18 | |||
JP2005022155A | 2005-01-27 | |||
JP2004323064A | 2004-11-18 | |||
JP2005321532A | 2005-11-17 | |||
JP2004314994A | 2004-11-11 | |||
JPH11238789A | 1999-08-31 | |||
JPH07263402A | 1995-10-13 |
Foreign References:
WO2001056073A1 | 2001-08-02 |
Attorney, Agent or Firm:
Mikio Yoshimiya
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