To provide a novel Cu alloy film which has high adhesion to a substrate and/or an insulation film and exhibits low electric resistivity even after a thermal treatment performed in a manufacturing process for a liquid crystal display device or the like.
There is provided a Cu alloy film for a display device and the Cu alloy film is made of a Cu-Mn-B alloy. If a Mn amount and a B amount in the depth direction of 50 nm (II) from the interface (I) of a substrate side of the Cu alloy film to the outermost surface of the Cu alloy film are defined as a Mn amount (MnI-II) and a B amount (BI-II), respectively, and if a Mn amount and a B amount in the depth direction from the depth of 50 nm (II) of the Cu alloy film to the outermost surface (III) of the Cu alloy film are defined as a Mn amount (MnII-III) and a B amount (BII-III), respectively, the relation between MnI-II and MnII-III of the Mn amount satisfies 2.0≤(MnI-II/MnII-III) and the relation between BI-II and BII-III of the B amount satisfies 1.5≤(BI-II/BII-III).
NAKAI JUNICHI
GOTO YASUSHI
MIKI AYA
JP2010098300A | 2010-04-30 | |||
JP2009097085A | 2009-05-07 | |||
JP2010098300A | 2010-04-30 |
WO2011013683A1 | 2011-02-03 |
Hisahiko Ueki
Tadashi Sugakawa
Hiroaki Ito
Akemi Takeoka