Title:
DRY FILM PHOTORESIST
Document Type and Number:
Japanese Patent JP2005173049
Kind Code:
A
Abstract:
To provide a dry film photoresist having high resolution, tent film strength and storage stability.
The dry film photoresist comprises a support body and a photosensitive resin composition layer, containing at least (A) polyurethane resin, having a carboxyl group and no ethylenically unsaturated bond, (B) a polymerizable compound having an ethylenically unsaturated bond, and (C) a photopolymerization initiator.
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Inventors:
TAKAHASHI HIDETOMO
TASHIRO TOMOKO
TASHIRO TOMOKO
Application Number:
JP2003410880A
Publication Date:
June 30, 2005
Filing Date:
December 09, 2003
Export Citation:
Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
G03F7/035; C08F2/44; C08F283/00; C08G18/30; G03F7/004; G03F7/027; G03F7/20; H05K3/06; (IPC1-7): G03F7/035; C08F2/44; C08F283/00; C08G18/30; G03F7/004; G03F7/027; H05K3/06
Attorney, Agent or Firm:
Yanagawa Yasuo