Title:
EXPOSURE APPARATUS
Document Type and Number:
Japanese Patent JP3275269
Kind Code:
B2
Abstract:
PURPOSE: To monitor intensity of illumination light particularly in a modified exposure apparatus, with a relatively simple configuration without occupying a large space on a path of the illumination light.
CONSTITUTION: Light emitted from a light source 28 impinges on fly-eye lenses 33A and 33B. Light beams output from the fly-eye lenses 33A and 33B serving as secondary light sources are condensed by condenser lenses 41 and 43 so as to illuminate a reticle R with a uniform illuminance distribution. Fluorescence type integrators 40A and 40B are disposed adjacent to the respective fly-eye lenses 33A and 33B on the side of the reticle R. Intensities of the light beams output from the respective secondary light sources are separately monitored by using fluorescence beams emitted from the respective integrators 40A and 40B.
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Inventors:
Masato Hamatani
Application Number:
JP20189692A
Publication Date:
April 15, 2002
Filing Date:
July 06, 1992
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
G03F7/20; H01L21/027; H01L21/30; (IPC1-7): H01L21/027; G03F7/20
Domestic Patent References:
| JP1270690A | ||||
| JP1274021A | ||||
| JP6453589A |
Attorney, Agent or Firm:
Satoshi Ohmori
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