METHOD FOR MANUFACTURING PHOTOMASK, METHOD FOR DETERMINING POSITION OF PHOTOMASK DEFECT CORRECTION, AND APPARATUS FOR DETERMINING POSITION OF PHOTOMASK DEFECT CORRECTION

Title:

METHOD FOR MANUFACTURING PHOTOMASK, METHOD FOR DETERMINING POSITION OF PHOTOMASK DEFECT CORRECTION, AND APPARATUS FOR DETERMINING POSITION OF PHOTOMASK DEFECT CORRECTION

Document Type and Number:

Japanese Patent JP2005309140

Kind Code:

A

Abstract:

To provide a method for manufacturing a photomask to improve the accuracy of estimating the degree of influences when a defect on a photomask is transferred onto a substrate.

The method includes steps of: detecting a defect in a pattern formed on a photomask (S1); obtaining a pattern image in a first region including the defect (S3); obtaining a pattern contour extraction data from the pattern image (S4); generating a first figure data based on the pattern contour extraction data and the pixel size on the photomask (S5); obtaining a pattern data corresponding to a second region including the first region from the design data of the photomask (S8); generating a second figure data from the pattern data (S9); generating a third figure data by replacing the second figure data with the first figure data only in a region where the first figure data and the second figure data overlap (S12); generating respective transfer patterns of the pattern figures represented by the second figure data and the third figure data (13); and comparing the transfer patterns to determine whether defect correction is necessary or not (S17).

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Inventors:

HIRANO TAKASHI
YAMANAKA EIJI

Application Number:

JP2004126795A

Publication Date:

November 04, 2005

Filing Date:

April 22, 2004

Export Citation:

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Assignee:

TOSHIBA CORP

International Classes:

G03F1/84; G06K9/00; G06T7/00; H01L21/027; (IPC1-7): G03F1/08; H01L21/027

Domestic Patent References:

JP2002323749A	2002-11-08
JP2004037579A	2004-02-05
JPH10301258A	1998-11-13
JP2000147748A	2000-05-26
JP2002229179A	2002-08-14
JP2002543470A	2002-12-17
JPH0887103A	1996-04-02

Attorney, Agent or Firm:

Takehiko Suzue
Satoshi Kono
Makoto Nakamura
Kurata Masatoshi
Sadao Muramatsu
Ryo Hashimoto

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