Title:
斜めフィッティング技術に基づいてアライメントモデルを決定するための方法
Document Type and Number:
Japanese Patent JP7260669
Kind Code:
B2
Abstract:
Described herein are methods of determining an alignment model associated with a mark layout. A method includes obtaining (a) first measurement data a relatively dense mark layout (e.g., more than 200 marks) in comparison with a relatively sparse mark layout (e.g., less than 65 marks) and a second measurement data associated with the relatively sparse mark layout, and (b) a first fitted model that describes object deformation for the relatively dense overlay mark layout; and determining the alignment model based on a second fitted model that describes object deformation for the relatively sparse mark layout, via an fitting technique, based on generalized squares fitting employing an oblique inner product matrix (e.g., W) or an oblique projection least squares fitting employing an oblique projection matrix (e.g., P).
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Inventors:
Full Sebos, Ed, Maria
Application Number:
JP2021564990A
Publication Date:
April 18, 2023
Filing Date:
April 02, 2020
Export Citation:
Assignee:
ASM L Netherlands B.V.
International Classes:
G03F7/20; G01B11/16
Domestic Patent References:
| JP2013074294A | ||||
| JP2017524960A |
Foreign References:
| WO2011087129A1 |
Attorney, Agent or Firm:
Morishita Kenki
Takeshi Aoki
Takeshi Aoki
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