Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
非有機溶剤型レジスト剥離剤組成物
Document Type and Number:
Japanese Patent JP4411624
Kind Code:
B2
More Like This:
JP3076270Description: A method for removing a resist film and a method for manufacturing a semiconductor device.
JP2015018957SEMICONDUCTOR PROCESS LIQUID AND PROCESSING METHOD USING THE SAME
JPH0954442PHOTORESIST REMOVER COMPOSITION AND REMOVING METHOD
Inventors:
Mizuki Takei
Yoshitaka Nishijima
Application Number:
JP2003108961A
Publication Date:
February 10, 2010
Filing Date:
April 14, 2003
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
Nagase Chemtex Co., Ltd.
International Classes:
G03F7/42; C09D9/00; H01L21/027
Domestic Patent References:
JP2000258924A
JP2002202617A
JP9269601A
JP4065184A
JP2002062668A
JP2000338685A
JP2000194144A
Attorney, Agent or Firm:
Shinya Furuya



 
Previous Patent: JPS4411623

Next Patent: 歯間清掃具