Title:
光酸発生剤、化学増幅ネガ型レジスト組成物及びレジストパターン形成方法
Document Type and Number:
Japanese Patent JP7371574
Kind Code:
B2
Abstract:
An onium salt having a partial structure of formula (A) is provided wherein Ra1 and Ra2 are hydrogen or a C1-C10 hydrocarbyl group in which hydrogen may be substituted by halogen and —CH2— may be replaced by —O— or —C(═O)—, both Ra1 and Ra2 are not hydrogen at the same time, Ra1 and Ra2 may bond together to form an aliphatic ring. A chemically amplified negative resist composition comprising the onium salt as acid generator forms a pattern of good profile having a high sensitivity, improved dissolution contrast, reduced LWR and improved CDU.
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Inventors:
Masahiro Fukushima
Satoshi Watanabe
Ryosuke Taniguchi
Naoya Inoue
Satoshi Watanabe
Ryosuke Taniguchi
Naoya Inoue
Application Number:
JP2020097345A
Publication Date:
October 31, 2023
Filing Date:
June 04, 2020
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F7/004; C07C25/02; C07C211/63; C07C309/07; C07C381/12; C07D307/00; C07D333/76; C09K3/00; G03F7/038; G03F7/20
Domestic Patent References:
| JP2006162735A | ||||
| JP2011121937A | ||||
| JP2018158892A | ||||
| JP2019204048A |
Foreign References:
| WO2016088648A1 |
Attorney, Agent or Firm:
Patent Attorney Corporation Eimei International Patent Office
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