Title:
PRODUCTION OF PHOTOPOLYMER COMPOSITION
Document Type and Number:
Japanese Patent JP3614220
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To produce a photopolymer excellent in adhesion by mixing a photopolymer obtained by reacting an organosilicon compound represented by a specified formula with a diamine compound and a dicarboxylic acid compound with a photopolymerization initiator and/or a photosensitizer.
SOLUTION: A solution prepared by dissolving 0.95-1.05mol% dicarboxylic acid compounds represented by formulas II a to II c (wherein R7, R9 and R11 are each a tetravalent aromatic residue; R8 is a group of formula III; and R10 is a group of formula IV or the like) and used in amounts satisfying the formulas: 20mol% < (formula II a + formula II b) < 100mol% and 0mol% < formula II c < 80mol% in an organic solution is mixed with 1mol of a mixture comprising an organosilicon compound represented by formula I (wherein R1, R2 and R5 are each a monovalent organic group; R3 is a mono- to bi-valent organic group or the like; (m) and (n) are each 0 or 1; and (l) is 1-3) and a diamine compound represented by the formula: H2N-R-NH2 (wherein R is a bivalent organic group) in a ratio of (0.1-5mol%/(95-99.9mol%), and the resulting mixture is reacted in the presence of a condensing agent to form a photopolymer. This polymer is mixed with about 0.1-20wt.% photopolymerization initiator and/or photosensitizer to obtain a photopolymer composition.
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Inventors:
Naoshishi Takeda
Toshiro Takeda
Hiroaki Makabe
Nobuyuki Sashida
Toshiro Takeda
Hiroaki Makabe
Nobuyuki Sashida
Application Number:
JP28228195A
Publication Date:
January 26, 2005
Filing Date:
October 30, 1995
Export Citation:
Assignee:
Sumitomo Bakelite Co., Ltd.
International Classes:
C08G73/10; C08K5/54; C08K5/541; C08K5/544; C08L79/08; (IPC1-7): C08G73/10; C08K5/541; C08L79/08
Domestic Patent References:
| JP6102667A | ||||
| JP6313039A | ||||
| JP5170901A | ||||
| JP64016831A | ||||
| JP6308731A | ||||
| JP5165217A | ||||
| JP2014242A |