Title:
RETICLE AND WAFER ALIGNMENT DEVICE
Document Type and Number:
Japanese Patent JPS61131440
Kind Code:
A
Abstract:
PURPOSE:To enable to obtain an extremely high matching precision by a method wherein the title device is provided with the circuit pattern of a reticle and a code mark for reticle discrimination. CONSTITUTION:The alignment device is a reticle and wafer aligment device provided with the circuit pattern of a reticle and a code mark for reticle discrimination. That is, the light-shielding unit BL is disposed in such a way that its surface to light-shield has a conjugate relation with the circuit pattern surface CP of the reticle RT by lens systems L4, L5 and L6, the reticle RT is replaced to a reticle, which is different in the thickness of its transparent part such as glass, and when the refracting power is made to vary, the light-shielding unit BL can be made to shift to the optical axis direction for maintaining the conjugate relation. Moreover, the light-shielding unit can be made to rotate by its rotational mechanism in the (theta) direction interlocking to the rotation of the reticle RT for positioning the rotational direction thereof with that of a wafer WF, which is disposed in the lower direction of the reticle RT and is subjected to exposure.
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Inventors:
AYADA NAOKI
YAMAMURA MITSUGI
HAMAZAKI FUMIYOSHI
KOSUGI MASAO
TAKAHASHI KAZUO
SEKI MITSUAKI
YAMAMURA MITSUGI
HAMAZAKI FUMIYOSHI
KOSUGI MASAO
TAKAHASHI KAZUO
SEKI MITSUAKI
Application Number:
JP25192584A
Publication Date:
June 19, 1986
Filing Date:
November 30, 1984
Export Citation:
Assignee:
CANON KK
International Classes:
H01L21/30; G03F7/20; G03F9/00; H01L21/027; (IPC1-7): G03F9/00
Attorney, Agent or Firm:
Tatsuo Ito