To provide a substrate processing apparatus which does not give stress to a substrate as much as possible during transferring the substrate onto a conveyance roller in an inclined state without complicating the mechanism of a robot hand which carries in the substrate.
A pusher 50 is arranged below a plurality of conveyance rollers 40 arranged in the tilted state by leaving intervals. Supporting pins 52 of the pusher 50 penetrate upward from below a supporting face of the substrate W by the conveyance rollers 40 through the arranging intervals of the conveyance rollers 40 so as to go up and down. Supporting height of the substrate W by a part of the supporting pins 52 is varied. Supporting height of a side end supporting pin 52e which is arranged on a tilted lower side of the conveyance roller 40 and supports a side end of the substrate W is set to be lower than supporting heights of the other supporting pins 52a to 52d, for example. Thus, the substrate W is set in such a way that the side end supported by the supporting pin 52e is bent and deformed downward at the time of supporting the substrate.
| JP2001198034 | WASHING DEVICE |
| JP4127866 | How to remove the coating on the edge of the substrate |
| WO/2005/117081 | LIQUID TREATMENT SYSTEM AND LIQUID TREATMENT METHOD |
YAMAMOTO SATOSHI
Kyuichi Ueki
Takao Ito