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Title:
TRANSPARENT COMPOUND, TRANSPARENT RESIN, PHOTOSENSITIVE RESIN COMPOSITION USING THE TRANSPARENT RESIN AND PRODUCTION OF SEMICONDUCTOR APPARATUS USING THE PHOTOSENSITIVE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JPH11222460
Kind Code:
A
Abstract:

To obtain the subject compound showing high transparency in a short wavelength range of ArF excimer laser, etc. by reacting a specific compound with a carboxylic acid in a strong acid.

A compound of formula I or II ((l) is 1 or 2; (m) is 0 or 2; (n) is 0, 1 or 2; R1 to R3 are each H or CH3; R3 and R4 are each a hydrocarbon) is reacted with a carboxylic acid (e.g. acrylic acid, methacrylic acid, maleic acid or the like) in a strong acid (e.g. sulfuric acid, benzenesulfonic acid, p- toluenesulfonic acid or the like) to give the objective compound. The compound of formula I or II is a compound containing a carbon-carbon bond bridged at the 1,3-positions or 1,4-positions of a cyclohexane ring, a cyclobutane ring or a cyclooctane ring and further a carbon-carbon bond of double bond and at least one of carbons forming the carbon-carbon bond of double bond is required to directly bond three carbon atoms. For example, pinene, camphene, carene, cedrene, cubebene, etc.


Inventors:
OSHIDA ATSUSHI
KUMADA TERUHIKO
Application Number:
JP11350398A
Publication Date:
August 17, 1999
Filing Date:
April 23, 1998
Export Citation:
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Assignee:
MITSUBISHI ELECTRIC CORP
International Classes:
G03F7/004; C07C69/54; C08F20/10; C08F22/10; C08K5/10; C08L33/04; C08L35/02; C09D133/04; C09D135/02; G03F7/038; G03F7/039; H01L21/027; (IPC1-7): C07C69/54; C08F20/10; C08F22/10; C08K5/10; C08L33/04; C08L35/02; C09D133/04; C09D135/02; G03F7/004; G03F7/038; G03F7/039; H01L21/027
Attorney, Agent or Firm:
Kaneo Miyata (2 outside)