Title:
POSITION MEASUREMENT DEVICE, ADJUSTING METHOD OF THE SAME, LITHOGRAPHY DEVICE, AND METHOD FOR MANUFACTURING ARTICLE
Document Type and Number:
Japanese Patent JP2016218379
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a position measurement device capable of measuring a position of a substrate with high accuracy even when a wave front aberration is induced, while avoiding increase in the size of the device.SOLUTION: The position measurement device is a position measurement device 10 for measuring a position of a substrate by receiving light passing through an optical system 23 by a sensor 5, and includes: a structure 4 for supporting the optical system 23 and the sensor 5; a determination part for determining a wave front aberration of the structure 4 when the structure 4 deforms by a pressure difference; and a control part for controlling an optical system 21 in accordance with an adjustment amount for correcting the deformation of the deformed structure 4, obtained based on the determination results by the determination part. The control part calculates a measurement stroke having a tolerance for the deformation of the structure 4, in a drive stroke to drive the optical system 21.SELECTED DRAWING: Figure 7
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Inventors:
SATO MASATO
YAMAGUCHI WATARU
YAMAGUCHI WATARU
Application Number:
JP2015106006A
Publication Date:
December 22, 2016
Filing Date:
May 26, 2015
Export Citation:
Assignee:
CANON KK
International Classes:
G03F9/00; G01B11/00; G03F7/20
Attorney, Agent or Firm:
Ryoichi Takaoka
Nao Oda
Nao Oda
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